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| The new process can be used to create a wide variety of quartz glass structures on a nanometer scale. Full Size Image Image Credit: Dr. Jens Bauer, KIT |
Process developed at KIT manages with relatively low temperatures and enables high resolutions for applications in optics and semiconductor technology - publication in science
Nanometer-fine structures made of quartz glass, which can be printed directly on semiconductor chips, are produced by a process developed at the Karlsruhe Institute of Technology (KIT). A hybrid organic-inorganic polymer resin serves as the starting material for the 3D printing of silicon dioxide. Since the process does not require sintering, the temperatures required for this are significantly lower. At the same time, a higher resolution enables nanophotonics with visible light. The research team reports in the journal Science.
Printing quartz glass consisting of pure silicon dioxide in micro and nanometer-fine structures opens up new possibilities for many applications in optics, photonics and semiconductor technology. So far, however, techniques based on traditional sintering have dominated. The temperatures required for sintering silicon dioxide nanoparticles are above 1,100 degrees Celsius - far too hot for direct separation on semiconductor chips. A research team led by Dr. Jens Bauer from the KIT's Institute for Nanotechnology (INT) has now developed a new process for producing transparent quartz glass with high resolution and excellent mechanical properties at significantly lower temperatures.









